Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD) techniques: Advances in thin film solar cells

Abstract

Thin film solar cells are gaining popularity as an affordable, efficient, and flexible substitute for traditional silicon solar cells . This success  is closely tied to the deposition techniques used to fabricate their layers. This review explores and analyzes the advances in the major  deposition techniques for solar cell applications, offering insights into their underlying principles, associated advantages, drawbacks, and  suitability for diverse materials and device architectures. The two primary deposition for thin film solar cells are PVD and CVD. In PVC  materials are physically ejecting from a target, and depositing it onto a substrate. While, CVD entails the reaction of gases or vapour  precursors to creating film on a substrate. The ability to achieve high purity, control over film properties, scalability, and compatibility  with flexible substrates are notable advantages. However, challenges such as high costs and complexity can impact the commercial  viability of certain techniques. Recent advancements in the technology of thin film deposition for solar cells include the discovery of novel materials with enhanced light absorption and electronic charge transport capabilities, emerging deposition processes such as pulsed  laser deposition, and atomic layer deposition scalable and low-cost processes like roll-to-roll processing, and integration with other  technologies like perovskite solar cells and tandem devices. Understanding these techniques and staying informed about recent  advancements and future directions empowers researchers and engineers to innovate and create improved thin film solar cells,  contributing significantly to a more sustainable future through enhanced solar energy harvesting technologies.