Hall Effect Parameters of Aluminium and Tungsten Co-Doped VO2 Thin Films

Abstract

The Hall Effect parameters of Al and W co-doped VO₂ thin films were studied in order to explain the effect of co-doping on the electrical properties of thermochromic VO₂ films. The carrier concentrations and conductivity of the films were found to increase with increase in temperature while carrier mobility decreased reaching a minimum around the transition temperature then slightly rose and became stable at high temperatures. Tungsten doped films displayed higher carrier concentrations and conductivity on both sides of the metal insulator transition and lower mobility compared to undoped and Al and W co-doped VO₂ thin films.

Keywords: Vanadium dioxide; Hall effect; Career concentration; career mobility